Figures

1 Introduction to Vacuum Technology

Figure 1.1: Overview of vacuum
Figure 1.2: Definition of total pressure
Figure 1.3: Definition of partial pressure
Figure 1.4: Mean free path between two collisions
Figure 1.5: Molecular number density (red, right-hand y axis) and mean free path (blue, left-hand y axis) for nitrogen at a temperature of 273.15 K
Figure 1.6: Profiles of the various types of flow regimes
Figure 1.7: Flow ranges in vacuum as a function of p · d
Figure 1.8: Conductance of a smooth round pipe as a function of the mean pressure in the pipe
Figure 1.9: Vapor pressure curves of various substances
Figure 1.10: Typical residual gas spectrum of a vessel evacuated by a turbomolecular pump

2 Basic calculations

Figure 2.1: No-load compression ratio for air with Roots pumps
Figure 2.2: Volume flow rate (pumping speed) of a pumping station with Hepta 100 and Okta 500
Figure 2.3: Drying system (schematic)
Figure 2.4: Roots pumping station for vapor condensation
Figure 2.5: Roots pumping station for vapor condensation
Figure 2.6: Roots pumping station for transformer drying
Figure 2.7: Gas throughput of different turbopumps at high process pressures
Figure 2.8: Vacuum system with pressure and throughput regulation

3 Mechanical components in vacuum

Figure 3.1: Temperature dependence of the elasticity modulus of austenitic stainless steel
Figure 3.2: Temperature dependence of the 0.2% yield point of austenitic stainless steel
Figure 3.3: De Long diagram
Figure 3.4: Cross section image of a laser weld
Figure 3.5: Cross section image of WIG orbital weld
Figure 3.6: O-ring seals in rectangular groove, trapezoidal-groove and in an angular position
Figure 3.7: ISO-KF connection with centering ring and clamping ring
Figure 3.8: ISO-KF flange mounted on base plate with centering ring and claw clamps
Figure 3.9: ISO-K connection with centering ring and double claw clamps
Figure 3.10: ISO-K flange mounted on base plate with centering ring and claw clamps
Figure 3.11: ISO-K flange mounted on base plate with O-ring nut and claw clamps for base plate with sealing groove
Figure 3.12: ISO-K flange mounted on base plate with O-ring nut and claw clamps for base plate with sealing groove
Figure 3.13: SO-F connection with centering ring and screws
Figure 3.14: ISO-K flange with bolt ring mounted on ISO-F flange with centering ring and screws
Figure 3.15: CF connection with copper flat gasket and screws
Figure 3.16: COF connection with copper wire seal and screws
Figure 3.17: EUV source chamber with cooling profiles and water-cooled flanges
Figure 3.18: Space simulation chamber with pillow plate cooling
Figure 3.19: CF viewport with glass-metal fusing
Figure 3.20: Electrical feedthrough with ceramically insulated wire conductor made of copper
Figure 3.21: Bellows-sealed angle valve
Figure 3.22: Inline valve with electropneumatic actuation
Figure 3.23: UHV gate valve
Figure 3.24: UHV all-metal gas dosing valve
Figure 3.25: Bellows-sealed UHV rotary feedthrough (cattail principle)
Figure 3.26: Magnetically coupled UHV rotary feedthrough
Figure 3.27: Elastomer-sealed rotary feedthrough
Figure 3.28: Z-axis precision manipulator
Figure 3.29: XY-axis precision manipulator

4 Vacuum generation

Figure 4.1: Overview of vacuum pumps
Figure 4.2: Operating principle of a rotary vane pump
Figure 4.3: Pfeiffer Vacuum rotary vane pumps
Figure 4.4: Accessories for rotary vane pumps
Figure 4.5: Operating principle of a diaphragm vacuum pump
Figure 4.6: Operating principle of a screw pump
Figure 4.7: HeptaDry rotors
Figure 4.8: HeptaDry with connections and accessories
Figure 4.9: Operating principle of an air cooled multi-stage Roots pump
Figure 4.10: Condensation of ammonium hexafluorosilicate (NH₄)2SIF₆ in a Roots pump operated at too low a temperature
Figure 4.11: Operating principle of a multi-stage Roots pump, process pump
Figure 4.12: ACP 120
Figure 4.13: A 100 L rear side with connections
Figure 4.14: A 203 H cross-section
Figure 4.15: A 1503 H process pumping station
Figure 4.16: Operating principle of a Roots pump
Figure 4.17: Operating principle of a gas-cooled Roots pump
Figure 4.18: No-load compression ratio for air for Roots pumps
Figure 4.19: Pumping speed of pumping stations with Okta 2000 and various backing pumps
Figure 4.20: Operating principle of a side channel vacuum pump
Figure 4.21: Degrees of freedom of a turbo-rotor
Figure 4.22: Operating principle of the turbomolecular pump
Figure 4.23: Specific turbopump pumping speeds
Figure 4.24: Pumping speed as a function of relative molecular mass
Figure 4.25: Pumping speed as a function of inlet pressure
Figure 4.26: Operating principle of a Holweck stage
Figure 4.27: Compression ratios of pure turbopumps and turbo drag pumps
Figure 4.28: Typical UHV residual gas spectrum (turbopump)
Figure 4.29: Standard HiPace turbopumps
Figure 4.30: ATH M magnetic-levitation turbopump
Figure 4.31: Example of turbopump accessories (for HiPace 300)

5 Vacuum measuring equipment

Figure 5.1: Design of a diaphragm vacuum gauge
Figure 5.2: Design of a capacitative diaphragm vacuum gauge
Figure 5.3: Operating principle of the Pirani vacuum gauge
Figure 5.4: Pirani vacuum gauge curves
Figure 5.5: Design of an inverted magnetron
Figure 5.6: Operating principle of an inverted magnetron
Figure 5.7: Design of a Bayard-Alpert vacuum gauge
Figure 5.8: Pressure measurement ranges and measurement principles
Figure 5.9: Application concepts DigiLine
Figure 5.10: ActiveLine application concepts
Figure 5.11: TPG 300 control unit for ModulLine sensors

6 Mass spectrometers and residual gas analysis

Figure 6.1: Total and partial pressure measurement
Figure 6.2: Components of a mass spectrometer
Figure 6.3: Operating principle of the 180° sector mass spectrometer
Figure 6.4: Sector field mass spectrometers: (a) Ion source, (b) Detector
Figure 6.5: Quadrupole deflection voltage
Figure 6.6: Stability diagram of a quadrupole filter
Figure 6.6b: Section through an axial ion source
Figure 6.7: Ionization as a function of electron energy
Figure 6.8: Fragment ion distribution of CO₂
Figure 6.9: Grid ion source
Figure 6.10: Discrimination of EID ions
Figure 6.11: Crossbeam ion source
Figure 6.12: Gas-tight axial ion source
Figure 6.13: SPM ion source
Figure 6.14: PrismaPlus ion sources
Figure 6.15: Operating principle of a Faraday Cup
Figure 6.16: Secondary electron multiplier (SEM) SEV
Figure 6.17: Operating principle of continuous secondary electron multiplier (C-SEM)
Figure 6.18: QMS with gas inlet system and crossbeam ion source
Figure 6.19: Differentially pumped QMS with various gas inlets
Figure 6.20: Potential curve in an electrically biased ion source
Figure 6.21: 90° off axis SEM

7 Leak detection

Figure 7.1: Bubble leak test on a bicycle tube
Figure 7.2: Working principle of a sector mass spectrometer
Figure 7.3: General leak detector flow chart
Figure 7.4: Operating principle of quartz window sensor
Figure 7.5: Vacuum diagram of the MiniTest quartz window leak detector on a system
Figure 7.6: Local leak detection with sniffing and vacuum methods
Figure 7.7: Integral leak detection with the vacuum method
Figure 7.8: Integral leak detection of enclosed objects with the sniffer method
Figure 7.9: Mass spectrum of a recipient with air leak
Figure 7.10: Leak testing unit for refrigerant hoses
Figure 7.11: Helium recovery unit

8 Contamination management solutions

Figure 8.1: Moore’s Law (documented by the number of transistors in Intel and AMD microprocessors)
Figure 8.2: Wafer handling with cassettes (left) and FOUPs (right)
Figure 8.3: Diamondlike crystal structure of Silicon
Figure 8.4: Classification of airborne molecular contamination AMC
Figure 8.5: AMC Sources in FOUPs
Figure 8.6: Airborne polar and non polar molecules
Figure 8.7: Gas-solid interaction at a surface
Figure 8.8: Surface sites
Figure 8.9: Surface after etching
Figure 8.10: Crystal growth at the edge of a wafer pattern
Figure 8.11: Pod regenerator process cycle

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